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1

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - Seattle, WA (Sunday 7 July 2002)] Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components - Shack-Hartmann wavefront sensor precision and accuracy

Neal, Daniel R., Copland, James, Neal, David A., Duparr, Angela, Singh, Bhanwar

Year:

2002

Language:

english

File:

PDF, 137 KB

english, 2002

2

The COVID-19 Pandemic and Herding Behaviour: Evidence from Indiaâs Stock Market

Dhall, Rosy, Singh, Bhanwar

Journal:

Millennial Asia

Year:

2020

File:

PDF, 670 KB

2020

3

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Improved wafer stepper alignment performance using an enhanced phase grating alignment system

Neijzen, Jaap H. M., Morton, Robert D., Dirksen, Peter, Megens, Henry J. L., Bornebroek, Frank, Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.12 MB

english, 1999

4

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 30 July 2000)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - Ellipsometry: a sophisticated tool for optical metrology

Azzam, Rasheed M. A., Al-Jumaily, Ghanim A., Duparre, Angela, Singh, Bhanwar

Year:

2000

Language:

english

File:

PDF, 958 KB

english, 2000

5

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Evaluation of the KLA-Tencor 2138 for line monitoring applications

Metteer, Brian, Garvin, Jr., James F., Cataldi, Frank, Ng, Albert, Button, Jon, Newell, Robyn, Rodriguez, Mike D., Miller, Arlisa, Singh, Bhanwar

Year:

1998

Language:

english

File:

PDF, 2.17 MB

english, 1998

6

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 30 July 2000)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - Numerical investigation of the resolution in solid immersion lens systems

Bischoff, Joerg, Brunner, Robert, Al-Jumaily, Ghanim A., Duparre, Angela, Singh, Bhanwar

Year:

2000

Language:

english

File:

PDF, 947 KB

english, 2000

7

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Focus and edge detection algorithms and their relevance to the development of an optical overlay calibration standard

Fox, Stephen H., Silver, Richard M., Kornegay, Edward, Dagenais, Mario, Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.02 MB

english, 1999

8

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Process development of 50-ÃIMP Ti with <2% thickness uniformity for 300-mm iLB

Zhang, Xinyu, Pancham, Ian, Chan, Anthony C., Subamani, Mani, Forster, John, von Gogh, Jim, Burnett, David, Kimura, Shin'ichiro, Singh, Bhanwar

Year:

2000

Language:

english

File:

PDF, 194 KB

english, 2000

9

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Toward nanometer accuracy measurements

Kramar, John, Amatucci, Edward, Gilsinn, David E., Jun, Jau-Shi J., Penzes, William B., Scire, Fredric, Teague, E. Clayton, Villarrubia, John S., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.80 MB

english, 1999

10

SPIE Proceedings [SPIE Optics & Photonics 2005 - San Diego, CA (Sunday 31 July 2005)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II - Vibration measurement of MEMS by digital laser microinterferometer

Liu, Sheng, Thomas, Dan, Samala, Praveen R., Yang, Lian X., Duparr½Á, Angela, Singh, Bhanwar, Gu, Zu-Han

Year:

2005

Language:

english

File:

PDF, 792 KB

english, 2005

11

SPIE Proceedings [SPIE Optical Engineering + Applications - San Diego, CA (Sunday 26 August 2007)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III - Interferometry for wafer dimensional metrology

Freischlad, Klaus, Tang, Shouhong, Grenfell, Jim, Duparré, Angela, Singh, Bhanwar, Gu, Zu-Han

Year:

2007

Language:

english

File:

PDF, 861 KB

english, 2007

12

SPIE Proceedings [SPIE Optics & Photonics 2005 - San Diego, CA (Sunday 31 July 2005)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II - Lifetime estimation of InGaAlP lasers under different operating conditions

Li, Yajun, Duparr½Á, Angela, Singh, Bhanwar, Gu, Zu-Han

Year:

2005

Language:

english

File:

PDF, 1.23 MB

english, 2005

13

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Automated defect inspection: past, present, and future

Sandland, Paul, Singh, Bhanwar

Year:

1998

Language:

english

File:

PDF, 1.91 MB

english, 1998

14

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II - Interferometric metrology of wafer nanotopography for advanced CMOS process integration

Valley, John F., Koliopoulos, Chris L., Tang, Shouhong, Duparre, Angela, Singh, Bhanwar

Year:

2001

Language:

english

File:

PDF, 698 KB

english, 2001

15

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Reduction of postdevelop defects and process times for DUV lithography

Krishna, Murthy S., Gurer, Emir, Lee, Ed C., Flores, Gary E., Ooka, Sandra S., Salois, John W., Cherry, Royal, Reynolds, Reese M., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 448 KB

english, 1999

16

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Supersparse overlay sampling plans: an evaluation of methods and algorithms for optimizing overlay quality control and metrology tool throughput

Pellegrini, Joseph C., Hatab, Ziad R., Bush, Jeffrey M., Glass, Thomas R., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 761 KB

english, 1999

17

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - Seattle, WA (Sunday 7 July 2002)] Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components - Novel scheme for the ultraprecise and fast measurement of the nanotopography of large wafers

Weingaertner, Ingolf, Wurm, Matthias, Geckeler, Ralf D., Elster, Clemens, Schulz, Michael, Dumitrescu, Eugen, Krey, Stefan, Heinisch, Josef, Duparr, Angela, Singh, Bhanwar

Year:

2002

Language:

english

File:

PDF, 310 KB

english, 2002

18

SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies - One way to accomplish the advanced requests of nanometrology: the nanometer coordinate measuring machine (NCMM)

Petersen, Ralph, Rothe, Hendrik, Duparre, Angela, Singh, Bhanwar

Year:

2003

Language:

english

File:

PDF, 1.24 MB

english, 2003

19

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - CD error budget analysis for 0.18-μm inlaid trench lithography

Postnikov, Sergei V., Sturtevant, John L., Lucas, Kevin D., Fu, Chong-Cheng, Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.26 MB

english, 1999

20

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - Seattle, WA (Sunday 7 July 2002)] Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components - Surface damage metrology: precision at low cost

Baker, Lionel R., Duparr, Angela, Singh, Bhanwar

Year:

2002

Language:

english

File:

PDF, 563 KB

english, 2002

21

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - An I-Line Image Reversal Process For Submicron Lithography

Chu, Ron, Singh, Bhanwar, Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 13.77 MB

english, 1989

22

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Feasibility of very low k1(=0.31) KrF lithography

Kim, Insung, Kim, Byeongsoo, Lee, Junghyun, Cho, Hanku, Moon, Joo-Tae, Burnett, David, Kimura, Shin'ichiro, Singh, Bhanwar

Year:

2000

Language:

english

File:

PDF, 609 KB

english, 2000

23

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - New patterned wafer inspection system with the function to classify fatal defects

Ikota, Masami, Sugimoto, Aritoshi, Inoue, Yuko, Nakamura, Hisato, Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 2.47 MB

english, 1999

24

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Defect reduction methodology in the lithography module

Peterson, Ingrid B., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 3.34 MB

english, 1999

25

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - New approach to correlating overlay and yield

Preil, Moshe E., McCormack, John S., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 665 KB

english, 1999

26

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Optical linewidth models: then and now

Larrabee, Robert D., Silver, Richard M., Davidson, Mark P., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 278 KB

english, 1999

27

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - New method of correlating product wafer yield to alignment performance and an optimized accounting method for product wafer alignment

Zhou, Hao, Singh, Bhanwar

Year:

1998

Language:

english

File:

PDF, 872 KB

english, 1998

28

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Improving the accuracy of overlay measurement through wafer sampling map rearrangement

Hsu, Chungwei, Chu, Ronfu, Chen, Jen H., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.21 MB

english, 1999

29

Stemming plug and its effect on fragmentation and muckpile shape parameters

Choudhary, Bhanwar Singh, Rai, Piyush

Journal:

International Journal of Mining and Mineral Engineering

Year:

2013

Language:

english

File:

PDF, 715 KB

english, 2013

30

SPIE Proceedings [SPIE Optics & Photonics 2005 - San Diego, California, USA (Sunday 31 July 2005)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II - Structural characterisation of semiconductors by computer methods of image analysis

Hernández-Fenollosa, M. A., Duparr½Á, Angela, Singh, Bhanwar, Cuesta-Frau, D., Damonte, L. C., Gu, Zu-Han, Satorre Aznar, M. A.

Year:

2005

Language:

english

File:

PDF, 654 KB

english, 2005

31

Effect of rock mass properties on blast-induced rock fragmentation

Choudhary, Bhanwar Singh, Sonu, Kumar, Kishore, Keshav, Anwar, Shahid

Journal:

International Journal of Mining and Mineral Engineering

Year:

2016

Language:

english

File:

PDF, 5.55 MB

english, 2016

32

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Real-time methodologies for monitoring airborne molecular contamination in modern DUV photolithography facilities

Kishkovich, Oleg P., Kinkead, Devon A., Higley, John K., Kirwin, Robert, Piatt, John, Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 5.22 MB

english, 1999

33

Contingent Valuation and Actual Behavior: Predicting Connections to New Water Systems in the State of Kerala, India

Charles C. Griffin, John Briscoe, Bhanwar Singh, Radhika Ramasubban and Ramesh Bhatia

Journal:

The World Bank Economic Review

Year:

1995

Language:

english

File:

PDF, 2.80 MB

english, 1995

34

Phenanthridine-Fused Tetracyclic Ring System: Metal-Free Diastereoselective Modular Construction of Highly Constrained Polyheterocycles via Post-Ugi Tandem Modifications

Singh, Karandeep, Malviya, Bhanwar Kumar, Jaiswal, Pradeep K., Verma, Ved Prakash, Chimni, Swapandeep Singh, Sharma, Siddharth

Journal:

Organic Letters

Year:

2019

Language:

english

File:

PDF, 1.15 MB

english, 2019

35

Photocontraction effect in amorphous Se1−xGex films

Bhanwar Singh, S. Rajagopalan, P.K. Bhat, D.K. Pandya, K.L. Chopra

Journal:

Solid State Communications

Year:

1979

Language:

english

File:

PDF, 319 KB

english, 1979

36

A novel bi-layer system for high resolution optical imaging

Bhanwar Singh, K. L. Chopra

Journal:

physica status solidi (a)

Year:

1981

Language:

english

File:

PDF, 232 KB

english, 1981

37

Genetic analysis of apical lethality inTriticum aestivumL.

S. M. S. Tomar, Vinod, Bhanwar Singh

Journal:

Year:

2007

Language:

english

File:

PDF, 238 KB

english, 2007

38

Hybrid chlorosis in wheat × rye crosses

S.M.S. Tomar, Bhanwar Singh

Journal:

Year:

1998

Language:

english

File:

PDF, 431 KB

english, 1998

39

Formation of slot cut for creating free face in solid limestone bench: A case study

Piyush Rai, Hyung-Sik Yang, Bhanwar Singh Choudhary

Journal:

Powder Technology

Year:

2012

Language:

english

File:

PDF, 1.40 MB

english, 2012

40

SPIE Proceedings [SPIE Optical Engineering + Applications - San Diego, CA (Sunday 26 August 2007)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III - Precision measurement of LED angular intensity distribution

Muzychko, O., Duparré, Angela, Singh, Bhanwar, Gu, Zu-Han

Year:

2007

Language:

english

File:

PDF, 1.16 MB

english, 2007

41

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Characterization of a positive chemically amplified photoresist for process control

Jakatdar, Nickhil H., Niu, Xinhui, Spanos, Costas J., Romano, Andrew R., Bendik, Joseph J., Kovacs, Ronald P., Hill, Stephen L., Singh, Bhanwar

Year:

1998

Language:

english

File:

PDF, 581 KB

english, 1998

42

SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies - Optical characterization in wide spectral range by a coherent spectrophotometer

Sirutkaitis, Valdas, Eckardt, Robert C., Balachninaite, Ona, Grigonis, Rimantas, Melninkaitis, A., Rakickas, T., Duparre, Angela, Singh, Bhanwar

Year:

2003

Language:

english

File:

PDF, 315 KB

english, 2003

43

Giant photocontraction effect in amorphous chalogenide thin films

Bhanwar Singh, S. Rajagopalan, P.K. Bhat, D.K. Pandya, K.L. Chopra

Journal:

Journal of Non-Crystalline Solids

Year:

1980

Language:

english

File:

PDF, 444 KB

english, 1980

44

Rural water supply in Kerala, India: How to emerge from a low-level equilibrium trap

Singh, Bhanwar, Ramasubban, Radhika, Bhatia, Ramesh, Briscoe, John, Griffin, Charles C., Kim, Chongchun

Journal:

Water Resources Research

Year:

1993

Language:

english

File:

PDF, 1.10 MB

english, 1993

45

SPIE Proceedings [SPIE Optical Engineering + Applications - San Diego, CA (Sunday 26 August 2007)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III - Theoretical and experimental investigations of non-goniometric scatterometry

Hahlweg, Cornelius, Rothe, Hendrik, Duparré, Angela, Singh, Bhanwar, Gu, Zu-Han

Year:

2007

Language:

english

File:

PDF, 500 KB

english, 2007

46

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Definition and control of contact holes in a CMP process

Wallace, Christine, Martin, Brian, Arthur, Graham G., Singh, Bhanwar

Year:

1998

Language:

english

File:

PDF, 2.05 MB

english, 1998

47

SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies - Laser induced fluorescence of calcium fluoride upon 193 nm and 157 nm excitation

Muehlig, Christian, Triebel, Wolfgang, Toepfer, Gabriela, Bergmann, Joachim, Brueckner, Sven, Chojetzki, Christoph, Martin, Regina, Duparre, Angela, Singh, Bhanwar

Year:

2003

Language:

english

File:

PDF, 286 KB

english, 2003

48

SPIE Proceedings [SPIE Optical Engineering + Applications - San Diego, CA (Sunday 26 August 2007)] Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III - Unified scatter model for rough surfaces at large incident and scatter angles

Harvey, James E., Krywonos, Andrey, Stover, John C., Duparré, Angela, Singh, Bhanwar, Gu, Zu-Han

Year:

2007

Language:

english

File:

PDF, 360 KB

english, 2007

49

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - Seattle, WA (Sunday 7 July 2002)] Advanced Characterization Techniques for Optical, Semiconductor, and Data Storage Components - Application of Shack-Hartmann wavefront sensing technology to transmissive optic metrology

Rammage, Ron R., Neal, Daniel R., Copland, Richard J., Duparr, Angela, Singh, Bhanwar

Year:

2002

Language:

english

File:

PDF, 288 KB

english, 2002

50

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Impact of optical absorption on process control for sub-0.15-nm device patterning using 193-nm lithography

Okoroanyanwu, Uzodinma, Levinson, Harry J., Romero, Jeremias, Singh, Bhanwar, Lee, Shih-Jung, Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 1.26 MB

english, 2000